| # | Document title | Authors | Year | Source | Cited by |
| 1 | Influence of sputtering power on structure and photocatalyst properties of DC magnetron sputtered TiO2 thin film | Pansila P., Pansila P., Witit-Anun N., Witit-Anun N., Chaiyakun S., Chaiyakun S. | 2012 | Procedia Engineering
32,pp. 862-867 | 37 |
| 2 | Infrared study on room-temperature atomic layer deposition of TiO 2 using tetrakis(dimethylamino)titanium and remote-plasma-excited water vapor | Kanomata K., Pansila P., Ahmmad B., Kubota S., Hirahara K., Hirose F. | 2014 | Applied Surface Science
308,pp. 328-332 | 33 |
| 3 | Room-temperature atomic layer deposition of ZrO 2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon | Kanomata K., Kanomata K., Tokoro K., Imai T., Pansila P., Miura M., Ahmmad B., Kubota S., Hirahara K., Hirose F. | 2016 | Applied Surface Science
387,pp. 497-502 | 28 |
| 4 | Kinetics and mechanism of adsorptive removal of copper from aqueous solution with poly(vinyl alcohol) hydrogel | Jamnongkan T., Kantarot K., Niemtang K., Pansila P., Wattanakornsiri A. | 2014 | Transactions of Nonferrous Metals Society of China (English Edition)
24(10),pp. 3386-3393 | 27 |
| 5 | Effect of poly(vinyl alcohol)/chitosan ratio on electrospun-nanofiber morphologies | Jamnongkan T., Jamnongkan T., Wattanakornsiri A., Pansila P., Migliaresi C., Kaewpirom S. | 2012 | Advanced Materials Research
463-464,pp. 734-738 | 18 |
| 6 | Growth kinetics for temperature-controlled atomic layer deposition of GaN using trimethylgallium and remote-plasma-excited NH 3 | Pansila P., Kanomata K., Kanomata K., Miura M., Ahmmad B., Ahmmad B., Kubota S., Kubota S., Hirose F., Hirose F. | 2015 | Applied Surface Science
357,pp. 1920-1927 | 15 |
| 7 | Room temperature atomic layer deposition of gallium oxide investigated by IR absorption spectroscopy | Pansila P., Kanomata K., Ahmmad B., Kubota S., Hirose F. | 2015 | IEICE Transactions on Electronics
E98C(5),pp. 382-389 | 10 |
| 8 | Nitrogen adsorption of Si(100) surface by plasma excited ammonia | Pansila P., Kanomata K., Ahmmad B., Kubota S., Hirose F. | 2015 | IEICE Transactions on Electronics
E98C(5),pp. 395-401 | 9 |
| 9 | Kinetic study on initial surface reaction of titanium dioxide growth using tetrakis(dimethylamino)titanium and water in atomic layer deposition process: Density functional theory calculation | Promjun T., Rattana T., Pansila P.P. | 2022 | Chemical Physics
562 | 8 |
| 10 | Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents | Kanomata K., Kanomata K., Ohba H., Pungboon Pansila P., Ahmmad B., Kubota S., Hirahara K., Hirose F. | 2015 | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
33(1) | 6 |
| 11 | Effect of oxygen partial pressure on the morphological properties and the photocatalytic activities of titania thin films on unheated substrates by sputtering deposition method | Pansila P., Witit-Anun N., Witit-Anun N., Chaiyakun S., Chaiyakun S. | 2013 | Advanced Materials Research
770,pp. 18-21 | 6 |
| 12 | Preparation of pure anatase TiO 2 thin films by DC sputtering technique: Study on the effect of oxygen partial pressure | Pungboon Pansila P., Pungboon Pansila P., Witit-Anun N., Witit-Anun N., Jamnongkan T., Chaiyakun S., Chaiyakun S. | 2012 | Advanced Materials Research
463-464,pp. 1415-1419 | 4 |
| 13 | Computational prediction of trimethylgallium adsorption on Si(100)(2×1) in atomic layer deposition | Sukhasena S., Pungboon Pansila P. | 2018 | Key Engineering Materials
759 KEM,pp. 43-47 | 4 |
| 14 | ENERGY AUDIT AND EVALUATION OF SPECIFIC ENERGY CONSUMPTION OF LIGHTING SYSTEMS IN A NEW BUILDING: A KASETSART UNIVERSITY CASE STUDY | Sriboon W., Pansila P.P., Khunthong S., Sukprasong S. | 2021 | Applied Engineering Letters
6(4),pp. 157-165 | 3 |
| 15 | Kinetic Study of Tetrakis(Dimethylamido)Titanium and Titanium Tetrachloride Adsorption on a Silicon Surface in Atomic Layer Deposition: A DFT Calculation | Promjun T., Rattana T., Pungboon Pansila P. | 2022 | Integrated Ferroelectrics
225(1),pp. 93-103 | 3 |
| 16 | Comparison of H2O2 and H2O oxidations on TDMAT absorbed on silicon(100) surface during reaction step of ALD–TiO2 process: A DFT study | Promjun T., Phothisonothai M., Sriboon W., Sukprasong S., Pansila P.P. | 2024 | Materials Today Communications
38 | 1 |