Journal

Article
Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
Journal
Journal of Vacuum Science & Technology A (ISSN: 07342101)
Volume
33
Issue
1
Year
มกราคม 2015
Page
01A113-1-01A113-6
Class
นานาชาติ
DOI
http://dx.doi.org/10.1116/1.4899181
Related Link
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